240709-K5-1

Type: Synthesis

ObjectId: 82489

Created: 7/9/2024 10:45:56 AM by Marx Patrick [patrick.marx-l69@rub.de]

Updated: 9/16/2026 4:27:19 PM by Dudarev Victor gmail [vic.dudarev@gmail.com]

Access: Public Sort Code (asc): 0

License: CC BY 4.0

Description:

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Referenced Objects (Reverse Association)

  • 10462 240709-K5-1
    Sample

    Co-Ni-O hot deposition 500°C (710°C set on PC, 2h preanneal) on Si/SiO2 with Pt-electrode layer (50nm Pt on 10nm Ta, 240624-K7-1); Co: MAG2, DC1, 40W; Ni: MAG3, DC2, 70W

All properties (except table)

Include all template properties
Type Name Value Comment
general process parameters
String chamber K5 K<i> (for example, "K7")
Float start vacuum 9e-008 Torr
Float process duration 1800 s
Float substrate temperature 500 °C
Float substrate rotation 0 RPM
String process gas Ar
String reactive gas 1 O2
Float flow RG 1 40 sccm
Float process pressure 15 mTorr
Float flow PG 40 sccm
target source configuration
Cathode 2
String target material Co
String target ID #3
Mag2-DC
Float ignition power cathode 2 40 W
Float pre clean power 2 40 W
Float pre clean time 2 120 s
Float pre clean pressure cathode 2 15 mTorr
Float power cathode 2 40 W
Float voltage cathode 2 383 V
Float current cathode 2 0.141 A
Cathode 3
String target material Ni
String target ID #13
Mag3-DC
Float ignition power cathode 3 70 W
Float pre clean power 3 70 W
Float pre clean time 3 120 s
Float pre clean pressure cathode 3 15 mTorr
Float power cathode 3 70 W
Float voltage cathode 3 330 V
Float current cathode 3 0.211 A

The table

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