240729-K3-1

Type: Synthesis show more

ObjectId: 87238

Created: 7/29/2024 1:24:47 PM by Marx Patrick [patrick.marx-l69@rub.de]

Updated: 9/16/2026 4:27:19 PM by Dudarev Victor gmail [vic.dudarev@gmail.com]

Access: Public Sort Code (asc): 0

License: CC BY 4.0

Description:

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10480 240729-K3-1
Sample
500°C hot deposition on Sapphire (ssp), 1h preannealing; Co: DC-750, 70W; Mn: pulsed DC, 100W, 10kHz, 5µs, 20W/min ramp, Ni: DCXS-1500, 70W

Type	Name	Value	Comment
general process parameters
String	chamber	K3	K<i> (for example, "K7")
Float	start vacuum	3.1e-008	Torr
Float	process duration	10800	s
Float	substrate temperature	500	°C
Float	substrate rotation	0	RPM
String	process gas	Ar
String	reactive gas 1	O2
Float	flow RG 1	40	sccm
Float	table height	25	mm
Float	substrate position	180	°
Float	process pressure	3	mTorr
Float	flow PG	80	sccm
target source configuration
Cathode 1
String	target material	Co
String	target ID	#10
Mag1-DC
Float	ignition power cathode 1	70	W
Float	pre clean power 1	70	W
Float	pre clean time 1	300	s
String	pre clean pressure cathode 1	20	mTorr
Float	power cathode 1	70	W
Float	voltage cathode 1	364	V
Float	current cathode 1	0.193	A
Cathode 2
String	target material	Ni
String	target ID	#8
Mag2-DC
Float	ignition power cathode 2	100	W
Float	pre clean power 2	0	W
Float	pre clean time 2	300	s
Float	pre clean pressure cathode 2	20	mTorr
Float	power cathode 2	70	W
Float	voltage cathode 2	297	V
Float	current cathode 2	0.239	A
Cathode 3
String	target material	Mn
String	target ID	#3
Mag3-Pulsed DC
Float	ignition power cathode 3	100	W
Float	ramp power step cathode 3	20	W
Float	duration per step cathode 3	60	s
Float	pre clean power 3	100	W
Float	pre clean time 3	300	s
Float	pre clean pressure cathode 3	20	mTorr
Float	power cathode 3	100	W
Float	voltage cathode 3	339	V
Float	current cathode 3	0.29	A
Float	frequency cathode 3	10000	Hz
Float	pulse length cathode 3	5	µs

No properties for rendering in a table found