Measurement Area 004 from 0010267
Type: Volume Composition show more
ObjectId: 127964
Created: 5/8/2025 12:41:43 PM by Dudarev Victor gmail [vic.dudarev@gmail.com]
Updated: 9/16/2026 4:27:19 PM by Dudarev Victor gmail [vic.dudarev@gmail.com]
Access: Public Sort Code (asc): 4
License: CC BY 4.0
Description: Automatically created via import from file (MA 004)
[no file attached]
: Co-La-O-V
Composition
| Element | Absolute | Percentage | |
|---|---|---|---|
| O | 90.212 % | ||
| V | 0.04 % | ||
| Co | 0.298 % | ||
| La | 9.449 % |
Referenced Objects (Reverse Association)
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10246 240313-K3-1
SampleLa-Co-V-O hot dep for electrochemistry, 1h preanneal on Si/SiO2 with 50 nm Pt on 10nm Ta, Co: DCXS-750, 70W, V: pulsed DC, 10kHz, 5µs, La2O3: RF, 200W, 20W/min ramp
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10252 240314-K3-1
SampleLa-Co-V-O hot dep 500°C on Sapphire (dsp) for band gap, 1h preanneal Co: DCXS-750, 70W; V: pulsed DC, 60W, 10kHz, 5µs, La2O3: RF, 200W, 20W/min ramp; Problems with pressure controller after 20min, continued with Ar/O2 flow of 40/20sccm, cathodes where shut down and start again to test gas flow values (for La2O3 with ramp of course), same issue after 8min (28min total) so process was canceled
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10256 240315-K3-1
SampleLa-Co-V-O hot dep 500°C on Sapphire (dsp) for band gap, 1h preanneal Co: DCXS-750, 70W; V: pulsed DC, 60W, 10kHz, 5µs, La2O3: RF, 200W, 20W/min ramp
Auto -
10267 240319-K3-1
SampleLa-Co-V-O hot deposition 500°C on Sapphire, La2O3: RF, 200W, 20W/min ramp, V: pulsed DC, 10kHz, 5µs, Co: DCXS-750, 70W, preanneal 1h
Auto