Measurement Area 156 from 0010267
Type: Volume Composition show more
ObjectId: 128116
Created: 5/8/2025 12:41:47 PM by Dudarev Victor gmail [vic.dudarev@gmail.com]
Updated: 9/16/2026 4:27:19 PM by Dudarev Victor gmail [vic.dudarev@gmail.com]
Access: Public Sort Code (asc): 156
License: CC BY 4.0
Description: Automatically created via import from file (MA 156)
[no file attached]
: Co-La-O-V
Composition
| Element | Absolute | Percentage | |
|---|---|---|---|
| O | 77.956 % | ||
| V | 0.91 % | ||
| Co | 15.943 % | ||
| La | 5.192 % |
Referenced Objects (Reverse Association)
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10246 240313-K3-1
SampleLa-Co-V-O hot dep for electrochemistry, 1h preanneal on Si/SiO2 with 50 nm Pt on 10nm Ta, Co: DCXS-750, 70W, V: pulsed DC, 10kHz, 5µs, La2O3: RF, 200W, 20W/min ramp
Auto -
10252 240314-K3-1
SampleLa-Co-V-O hot dep 500°C on Sapphire (dsp) for band gap, 1h preanneal Co: DCXS-750, 70W; V: pulsed DC, 60W, 10kHz, 5µs, La2O3: RF, 200W, 20W/min ramp; Problems with pressure controller after 20min, continued with Ar/O2 flow of 40/20sccm, cathodes where shut down and start again to test gas flow values (for La2O3 with ramp of course), same issue after 8min (28min total) so process was canceled
Auto -
10256 240315-K3-1
SampleLa-Co-V-O hot dep 500°C on Sapphire (dsp) for band gap, 1h preanneal Co: DCXS-750, 70W; V: pulsed DC, 60W, 10kHz, 5µs, La2O3: RF, 200W, 20W/min ramp
Auto -
10267 240319-K3-1
SampleLa-Co-V-O hot deposition 500°C on Sapphire, La2O3: RF, 200W, 20W/min ramp, V: pulsed DC, 10kHz, 5µs, Co: DCXS-750, 70W, preanneal 1h
Auto
All properties (except table)
| Type | Name | Value | Comment | |
|---|---|---|---|---|
| Int | Measurement Area | 156 | Measurement Area index (1..342) | 72109 |
| Float | x | 40.433 | 72109 | |
| Float | y | -4.5 | 72109 | |
| String | Phases | ICSD-36256;ICSD-17668 | 117085 | |
| Float | R | 7410.03 | Ohm | 72452 |
The table
| PhaseName | Phase |
|---|---|
| Spinel | ICSD-36256 |
| Perovskite | ICSD-17668 |