240306-K3-1

Type: Synthesis show more

ObjectId: 62209

Created: 3/6/2024 2:14:02 PM by Marx Patrick [patrick.marx-l69@rub.de]

Updated: 9/16/2026 4:27:19 PM by Dudarev Victor gmail [vic.dudarev@gmail.com]

Access: Public Sort Code (asc): 0

License: CC BY 4.0

Description:

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10229 240306-K3-1
Sample
Deposition for rate at RT on crosses wafer; La2O3: RF, 200W, 20W/min ramp; Co: DC-750, 70W; V: pulsed DC, 60W

Type	Name	Value	Comment
general process parameters
Float	start vacuum	4e-007	Torr
Float	process duration	7200	s
Float	substrate temperature	25	°C
Float	substrate rotation	0	RPM
String	process gas	Ar
String	reactive gas 1	O2
Float	flow RG 1	37	sccm
Float	table height	25	mm
Float	substrate position	180	°
Float	process pressure	3	mTorr
Float	flow PG	80	sccm
target source configuration
Cathode 1
String	target material	Co
String	target ID	#14
Mag1-DC
Float	ignition power cathode 1	70	W
Float	pre clean power 1	70	W
Float	pre clean time 1	300	s
String	pre clean pressure cathode 1	20	mTorr
Float	power cathode 1	70	W
Float	voltage cathode 1	397	V
Float	current cathode 1	0.178	A
Cathode 2
String	target material	V
String	target ID	#3
Mag2-Pulsed DC
Float	ignition power cathode 2	70	W
Float	pre clean power 2	60	W
Float	pre clean time 2	300	s
Float	pre clean pressure cathode 2	20	mTorr
Float	power cathode 2	60	W
Float	voltage cathode 2	322	V
Float	current cathode 2	0.18	A
Float	frequency cathode 2	10000	Hz
Float	pulse length cathode 2	5	µs
Cathode 3
String	target material	La2O3
String	target ID	#1
Mag3-RF
Float	ignition power cathode 3	200	W
Float	ramp power step cathode 3	20	W
Float	duration per step cathode 3	60	s
Float	pre clean power 3	200	W
Float	pre clean time 3	300	s
Float	pre clean pressure cathode 3	20	mTorr
Float	power forward cathode 3	198	W
Float	power reflected cathode 3	0	W
Float	load cathode 3	30	%
Float	tune cathode 3	26	%

No properties for rendering in a table found