Si + SiO2 (cross-patterned)
Type: Substrate show more
ObjectId: 28745
Created: 10/17/2023 10:38:21 AM by Dudarev Victor gmail [vic.dudarev@gmail.com]
Updated: 9/16/2026 4:27:19 PM by Dudarev Victor gmail [vic.dudarev@gmail.com]
Access: Public Sort Code (asc): 0
License: CC BY 4.0
Description:
[no file attached]
Referenced Objects (Reverse Association)
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10229 240306-K3-1
SampleDeposition for rate at RT on crosses wafer; La2O3: RF, 200W, 20W/min ramp; Co: DC-750, 70W; V: pulsed DC, 60W
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10303 240403-K3-1
SampleLa-Co-Fe-V-O RT deposition, La2O3: RF, 200W, 20W/min ramp, V: pulsed DC, 60W, 10kHz, 5µs; Co: DCXS-750, 70W; Fe: DCXS-1500, 100W
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10474 240723-K3-1
SampleDeposition for rate at RT on crosses wafer; Co: DC-750, 70W; Mn: pulsed DC, 100W, 10kHz, 5µs, 20W/min ramp
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10016 Ta/TiNiCu 800 nm with bias
Sample -
10890 250414-K3-1
SampleThickness Gradient on Crosses Wafer, Co: cathode 3, 100W, 2h
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11070 250731-K3-1
SampleCo-Ni-O RT, Ni: 100W, pulsed DC, 350kHz, 1.4µs, Co: DCXS-750, 70W, 40sccm Ar 20sccm O2
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11083 250813-K3-1
SampleCo-Ni-O RT, Ni: 100W, pulsed DC, 350kHz, 1.4µs, Co: DCXS-750, 70W, 40sccm Ar 5sccm O2
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11645 260714-K3-1
SampleCo-O RT deposition on crosses for rate, with thickness gradient
All properties (except table)
No properties found